Publications by authors named "Jaan Aarik"

3 Publications

  • Page 1 of 1

Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films.

ACS Omega 2017 Dec 11;2(12):8836-8842. Epub 2017 Dec 11.

Department of Electronics, University of Valladolid, Paseo Belén, 15, 47011 Valladolid, Spain.

Mixed films of a high-permittivity oxide, ErO, and a magnetic material, FeO, were grown by atomic layer deposition on silicon and titanium nitride at 375 °C using erbium diketonate, ferrocene, and ozone as precursors. Crystalline phases of erbium and iron oxides were formed. Growth into three-dimensional trenched structures was demonstrated. A structure deposited using tens to hundreds subsequent cycles for both constituent metal oxide layers promoted both charge polarization and saturative magnetization compared to those in the more homogeneously mixed films.
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http://dx.doi.org/10.1021/acsomega.7b01394DOI Listing
http://www.ncbi.nlm.nih.gov/pmc/articles/PMC6645657PMC
December 2017

Enhanced flexibility and electron-beam-controlled shape recovery in alumina-coated Au and Ag core-shell nanowires.

Nanotechnology 2017 Dec;28(50):505707

Institute of Physics, University of Tartu, W. Ostwaldi 1, 50411, Tartu, Estonia.

The proper choice of coating materials and methods in core-shell nanowire (NW) engineering is crucial to assuring improved characteristics or even new functionalities of the resulting composite structures. In this paper, we have reported electron-beam-induced reversible elastic-to-plastic transition in Ag/AlO and Au/AlO NWs prepared by the coating of Ag and Au NWs with AlO by low-temperature atomic layer deposition. The observed phenomenon enabled freezing the bent core-shell NW at any arbitrary curvature below the yield strength of the materials and later restoring its initially straight profile by irradiating the NW with electrons. In addition, we demonstrated that the coating efficiently protects the core material from fracture and plastic yield, allowing it to withstand significantly higher deformations and stresses in comparison to uncoated NW.
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http://dx.doi.org/10.1088/1361-6528/aa973cDOI Listing
December 2017

Nanoscale characterization of TiO(2) films grown by atomic layer deposition on RuO(2) electrodes.

ACS Appl Mater Interfaces 2014 Feb 10;6(4):2486-92. Epub 2014 Feb 10.

Chair of Electron Devices, University of Erlangen-Nuremberg , Cauerstrasse 6, 91058 Erlangen, Germany.

Topography and leakage current maps of TiO2 films grown by atomic layer deposition on RuO2 electrodes using either a TiCl4 or a Ti(O-i-C3H7)4 precursor were characterized at nanoscale by conductive atomic force microscopy (CAFM). For both films, the leakage current flows mainly through elevated grains and not along grain boundaries. The overall CAFM leakage current is larger and more localized for the TiCl4-based films (0.63 nm capacitance equivalent oxide thickness, CET) compared to the Ti(O-i-C3H7)4-based films (0.68 nm CET). Both films have a physical thickness of ∼20 nm. The nanoscale leakage currents are consistent with macroscopic leakage currents from capacitor structures and are correlated with grain characteristics observed by topography maps and transmission electron microscopy as well as with X-ray diffraction.
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http://dx.doi.org/10.1021/am4049139DOI Listing
February 2014
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