We report a simple but efficient method to fabricate versatile graphene nanonet (GNN)-devices. In this method, networks of V2O5 nanowires (NWs) were prepared in specific regions of single-layer graphene, and the graphene layer was selectively etched via a reactive ion etching method using the V2O5 NWs as a shadow mask. The process allowed us to prepare large scale patterns of GNN structures which were comprised of continuous networks of graphene nanoribbons (GNRs) with chemical functional groups on their edges.